Presentation on Ulvac's Ion Implant System IH-860PSIC

News

HIGH-TEMP ION IMPLANTER FOR SIC IH-860DSIC The Ion Implanter IH-860DSIC is a system especially designed for mass production with high temp ESC for SiC.

IH-860eqp-s-204b5261.jpg
Features
  • dual stage high throughput implanter for up to 150mm substrates
dual stage for bridge tool capability (100/150mm) or both high temp. process & RT process are available
up to 500C with hot plate type ESC and pre-heat stage
rapid heating and good temperature uniformity
400keV single / 800keV double / 1.2MeV for triple Charge
Footprint 8mx3m
SPECIAL FEATURES / FURTHER APPLICATIONS
 
SiC devices

Join our subscribers list to get the latest news, updates and special offers delivered directly in your inbox.