12 October 2018 News HIGH-TEMP ION IMPLANTER FOR SIC IH-860DSIC The Ion Implanter IH-860DSIC is a system especially designed for mass production with high temp ESC for SiC. Features dual stage high throughput implanter for up to 150mm substrates dual stage for bridge tool capability (100/150mm) or both high temp. process & RT process are available up to 500C with hot plate type ESC and pre-heat stage rapid heating and good temperature uniformity 400keV single / 800keV double / 1.2MeV for triple Charge Footprint 8mx3m SPECIAL FEATURES / FURTHER APPLICATIONS SiC devices